Introduction to MEMS


CMPE Degree: This course is Not Applicable for the CMPE degree.

EE Degree: This course is Not Applicable for the EE degree.

Lab Hours: 0 supervised lab hours and 0 unsupervised lab hours.

Technical Interest Group(s) / Course Type(s): Cross-listed courses, Nanotechnology

Course Coordinator:

Prerequisites: None.

Corequisites: None.

Catalog Description

Introduction to Micro-Electro-Mechanical systems: Microfabrication techniques including: photolithography, etching, physical and chemical vapor deposition, electroplating, bonding and polymer processing. Application to sensors and actuators. Credit not allowed for both ECE 6229 and ME 6229 or CHBE 6229.

Course Outcomes

Not Applicable

Student Outcomes

In the parentheses for each Student Outcome:
"P" for primary indicates the outcome is a major focus of the entire course.
“M” for moderate indicates the outcome is the focus of at least one component of the course, but not majority of course material.
“LN” for “little to none” indicates that the course does not contribute significantly to this outcome.

1. ( Not Applicable ) An ability to identify, formulate, and solve complex engineering problems by applying principles of engineering, science, and mathematics

2. ( Not Applicable ) An ability to apply engineering design to produce solutions that meet specified needs with consideration of public health, safety, and welfare, as well as global, cultural, social, environmental, and economic factors

3. ( Not Applicable ) An ability to communicate effectively with a range of audiences

4. ( Not Applicable ) An ability to recognize ethical and professional responsibilities in engineering situations and make informed judgments, which must consider the impact of engineering solutions in global, economic, environmental, and societal contexts

5. ( Not Applicable ) An ability to function effectively on a team whose members together provide leadership, create a collaborative and inclusive environment, establish goals, plan tasks, and meet objectives

6. ( Not Applicable ) An ability to develop and conduct appropriate experimentation, analyze and interpret data, and use engineering judgment to draw conclusions

7. ( Not Applicable ) An ability to acquire and apply new knowledge as needed, using appropriate learning strategies.

Strategic Performance Indicators (SPIs)

Not Applicable

Course Objectives

Topical Outline

a) Introduction and scaling laws
b) Introduction to lithography
c) Mask aligner and imaging optics
d) Resolution in photolithography and mask layout
e) Structure of silicon and properties
f) Oxidation and diffusion
g) Nucleation and growth
h) Evaporation and Sputtering
i) CVD and PECVD
j) Atomic Layer Deposition
k) Polysilicon
l) Wet etching
m) Surface micromachining
n) Bulk micromachining processes
o) Corner compensation and etch stop
p) Vacuum physics and kinetic theory
q) Plasma and Deep RIE etching
r) Characterization Methods
s) PDMS and SU-8 MEMS processing
t) Stereolithography
u) Wafer anodic bonding and local bonding
v) Electroplating metals
w) MEMS/NEMS Sensors
x) Microcantilever Fabrication Processes
a) Lab safety and clean room protocol
b) CAD and Mask Making
c) Photolithography
d) Etching and Bulk Micromachining
e) Metal deposition
f) Characterization Methods
g) BioMEMS Device Molding
h) Anodic bonding & MEMS Packaging (optional)