Plasma Processing of Electronic Materials and Devices

This course is no longer offered


CMPE Degree: This course is Not Applicable for the CMPE degree.

EE Degree: This course is Not Applicable for the EE degree.

Lab Hours: 0 supervised lab hours and 0 unsupervised lab hours.

Technical Interest Group(s) / Course Type(s): Courses for non-ECE majors, Nanotechnology

Course Coordinator:

Prerequisites: None.

Corequisites: None.

Catalog Description

Fundamental physics, chemistry, chemical engineering and electrical
engineering principles inherent in plasma processes. Includes etching,
deposition, diagnostic methods, and control schemes. Cross-listed with
CHE 6759.

Course Outcomes

Not Applicable

Student Outcomes

In the parentheses for each Student Outcome:
"P" for primary indicates the outcome is a major focus of the entire course.
“M” for moderate indicates the outcome is the focus of at least one component of the course, but not majority of course material.
“LN” for “little to none” indicates that the course does not contribute significantly to this outcome.

1. ( Not Applicable ) An ability to identify, formulate, and solve complex engineering problems by applying principles of engineering, science, and mathematics

2. ( Not Applicable ) An ability to apply engineering design to produce solutions that meet specified needs with consideration of public health, safety, and welfare, as well as global, cultural, social, environmental, and economic factors

3. ( Not Applicable ) An ability to communicate effectively with a range of audiences

4. ( Not Applicable ) An ability to recognize ethical and professional responsibilities in engineering situations and make informed judgments, which must consider the impact of engineering solutions in global, economic, environmental, and societal contexts

5. ( Not Applicable ) An ability to function effectively on a team whose members together provide leadership, create a collaborative and inclusive environment, establish goals, plan tasks, and meet objectives

6. ( Not Applicable ) An ability to develop and conduct appropriate experimentation, analyze and interpret data, and use engineering judgment to draw conclusions

7. ( Not Applicable ) An ability to acquire and apply new knowledge as needed, using appropriate learning strategies.

Strategic Performance Indicators (SPIs)

Not Applicable

Course Objectives

Topical Outline

Introduction (1 week)
-- need for plasma etching/deposition
-- goals
Basic plasma physics/chemistry (2 weeks)
-- kinetic molecular theory
-- electron energy distribution
-- ion energy distribution
Etch/Deposition reactor configurations (1 week)
-- barrel, parallel plate, high density
Etching/Deposition parameters (2 weeks)
-- power, pressure, frequency
Modeling and simulation (1 week)
-- chemical, physical, mathematical, profile development
Process monitoring and endpoint detection (2 weeks)
-- mass spectrometry, optical emission
Process control (1 week)
-- strategies
Etching specific materials (1 week)
-- insulators, semiconductors, conductors
Deposition of specific materials (1 week)
-- insulators, semiconductors, conductors
Damage issues (1 week)
-- radiation, particles
Safety & environmental issues, future plasma directions (1 week)
Exams & project presentations (1 week)